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Fabrication Technology(1)

Fabrication Technology(1). nMOS Fabrication CMOS Fabrication p-well process n-well process twin-tub process. Fabrication Technology(2). All the devices on the wafer are made at the same time After the circuitry has been placed on the chip

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Fabrication Technology(1)

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  1. Fabrication Technology(1) • nMOS Fabrication • CMOS Fabrication • p-well process • n-well process • twin-tub process

  2. Fabrication Technology(2) • All the devices on the wafer are made at the same time • After the circuitry has been placed on the chip • the chip is overglassed (with a passivation layer) to protect it • only those areas which connect to the outside world will be left uncovered (the pads) • The wafer finally passes to a test station • test probes send test signal patterns to the chip and monitor the output of the chip • The yield of a process is the percentage of die which pass this testing • The wafer is then scribed and separated up into the individual chips. These are then packaged

  3. Fabrication Technology(3)

  4. Fabrication Technology(4) Photolithography process

  5. Fabrication Technology(5) • Resists • negative: areas to be preserved are hardened after exposure to light • positive: areas to be preserved are not exposed to light Exposure UV lightused to sensitize the resist using amask. Develop Resist areas that are exposed (positive) or not exposed (negative) are removed with an acid and water wash. resist protected area resist exposed area

  6. Fabrication Technology(6) Etch Areas that are exposed and not protectedby the resist are etched with an acid and water wash. What is left are, depending on the layer being worked on, are patterns that expose underlying layers.

  7. Cmos Inverter Fabrication

  8. Cmos Inverter Fabrication

  9. Layout of an Inverter Back is metallized to provide a good ground connection

  10. Step 1:Make the N-Well Top view Mask 1 Cross-sectional view

  11. Step 2: Deposit Field Oxide

  12. Step 3: Open Field with Active Mask Mask 2

  13. Step 4: Deposit Gate Oxide The thickness and the quality of the gate oxide are two of the most critical fabrication parameters, since they strongly affect the operational characteristics of the MOS transistor, as well as its long-term reliability.

  14. Step 5: Deposit Polysilicon

  15. Step 6: Get Oxide Cut (etch) Mask 3

  16. Step 7: N-Diffusion Implant

  17. Step 8: P-Diffusion Implant

  18. Step 9:Deposit More Oxide 3/13/2005

  19. Step 10: Contact Cut Etch Mask 4

  20. Step 11: Metal 1 Deposit Mask 5

  21. Step 12:Deposit More oxide

  22. Steps 13 & 14: Planarize(Polish) & Via Cut(Etch) Mask 6

  23. Step15: Metal 2 Deposition

  24. Metal 1 Metal 2 Gate oxide Field Oxide Polysilicon N-Diffusion P-Diffusion Step 16: Passivation Layer(Scratch Protect) p p n n N well P substrate

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