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1. XAFS beam lines in JapanKEKPFNOMURA Masaharu 1. Overview of XAFS activity
2. Progress of XAFS beam line technology at PF
3. Progress of XAFS beam line technology at SPring-8
4. Key points for designing XAFS beam lines
4. XAFS activities XAFS as a daily tool - transmission, fluorescence, CEY
surface XAFS, total reflection XAFS
fluorescent XAFS with MSSD towards ultra dilute systems
utilization of soft X-ray
micro XAFS
With polarization control - MCD, NCD
time-resolved XAFS - quick, dispersive
site-resolved XAFS, state resolved XAFS
5. Photon FactoryBL-10B
6. Photon Factory BL-12C Double crystal mono. + bent cylindrical mirror (Rh coat)
Fluorescent XAFS with MSSD
7. Photon Factory BL-9A New optics using bent conical mirrors.high flux with high energy resolution
Control higher orders by using parallely aligned mirrors<10-6 , E>4keV)
extension to SX
8. SPring-8 BL01B1
9. Wide energy range of BL01B1
13. Beam line with focusing system? Fluorescent XAFS with Lytle detector
14. Multi-element SSD
S/N = S/(S+B)1/2, S/B~1/200
Separation of fluorescent signal and scattering is the key. Thus require high energy resolution and high throughput
15. Key points to design XAFS beam lines wide energy range (4(2.2) -- 23 keV or wider)
Fairly high energy resolution (~10-4)
simple beam line optics
fixed, fairly small focused beam
negligible higher order content (<10-4)mirror (lower E), detune (higher E)
various detection modestransmission, fluorescent detection, CEY
wide space for sample attachmentscryocooler, furnace etc.
Nearby chemistry lab., exhaust handling
16. ?X???????
17. MoS2?XAFS